Molecular Formula: CF4
Molecular Weight: 88
|
Ingredient |
Standard |
Unit |
|
|
CF4 |
≥ |
99.98 |
%V |
|
Air |
≤ |
100 |
ppmv |
|
H2O |
≤ |
10 |
ppmv |
|
CO2 |
≤ |
30 |
ppmv |
|
SF6 |
≤ |
10 |
ppmv |
|
Other |
≤ |
30 |
ppmv |
|
Acidity (in HF) |
≤ |
0.3 |
ppmw |
Performance and Property:
It is permanent gas and with no smell and color under normal temperature and pressure; stable non toxic substance
Uses:
Plasma etching gas and is widely used for electronic surface cleaning
Storage:
Cool and ventilated
Transportation:
Meet related regulation
Packing:
In special treated clean, dry gas cylinde and the volume is 40L, 12.5L, 10L, 8L and 4L or according to requirements
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